Tue, 21 July, 2009, 17:15-18:15, Foyer
The design process and industrial use of materials with embedded micro and nano structures require rapid and non-destructive techniques of characterisation of these structures. One such technique is the Optical Diffraction Microscopy, where features of the sample under investigation are reconstructed from the measured optical power in the scattered far field. Since the structures of interest are typically comparable to the wavelength of the illuminating light, it is advantageous to approach the inverse scattering problem using the full classical electromagnetic model, rather than asymptotic formulations. The Method of Auxiliary Sources (MAS) is an efficient, non-asymptotic numerical technique applicable to forward and inverse electromagnetic scattering. We illustrate the use of a simple MAS implementation in the approximation of solution of relevant inverse problems which arise in Optical Diffraction Microscopy.
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